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Euv
Euv news and technical articles from Laser Focus World. Search Euv latest and archived news and articles
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NIST measures contamination of EUV lithography optics due to outgassing
… a clean multilayer surface (left) when EUV photons react with gases (center), resulting ..... that cause contamination of extreme-UV ( EUV ) lithography optics, researchers at the ..... and eliminate chemical contaminants on an EUV scanner’s Bragg-reflector focusing mirrors …
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HIGH-HARMONIC GENERATION: New EUV source is compact
Because extreme-ultraviolet ( EUV ) radiation is so difficult to produce, any ..... who happens to come up with a good idea using EUV light is soon confronted with the complexity and large size of EUV sources. If such a source could be shrunk …
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Cymer and ASML ship first EUV source that could extend Moore's law ten more years
… produced plasma (LPP) extreme ultraviolet ( EUV ) lithography source to ASML. The companies say that EUV will support Moore's Law--the trend toward ..... collector mirrors enable next-generation EUV lithography "). Cymer's EUV source, the …
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EUV -source power rises
… power for use in extreme-ultraviolet ( EUV ) lithography has increased significantly ..... learned here at the Sematech-sponsored EUV Source Workshop, held during the Third International Symposium on EUV Lithography (EUVL) earlier this month …
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WIPO PUBLISHES PATENT OF CYMER FOR "METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS" (AMERICAN INVENTORS)
… Publication No. WO/2012/050685 was published on April 19. Title of the invention: "METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS." Applicants: CYMER, INC. (US). Inventors: William N. Partlo (US), Richard L. Sandstrom …
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Laser-produced plasma presents most viable route to EUV lithography
… development of extreme-ultraviolet ( EUV ) lithography sources continues at accelerated ..... 2009. The availability of a high-power EUV source for 13.5 nm radiation has been ..... development to enable the realization of EUV lithography. Photoresist performance parameters …
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EUVA consortium develops 104 Watt LPP light source for EUV lithography
… announced that its extreme ultraviolet ( EUV ) light source achieved a power output of ..... produced plasma (LPP) light sources for EUV lithography tools since 2002 and proposed ..... production applications (see related story " EUV mirror shows near-zero reflectance at …
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IMEC, ASML collaborate on EUV lithography program
… of a full-field extreme ultraviolet ( EUV ) pre-production tool, to be installed ..... An IMEC Industrial Affiliation Program on EUV lithography will begin in early 2006 and ..... 32-nm node and beyond. To ensure that EUV technology is ready when the transition …
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A plus and a minus for EUV litho research
… that the dose of extreme-ultraviolet ( EUV ) light required to expose a semiconductor ..... from argon fluoride excimer lasers. But EUV lithography, still in the R&D stage ..... implications for future manufacturing. If EUV photoresists are twice as sensitive as previously …
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Intel and Corning enter joint development agreement for EUV photomask substrates
… substrates required for extreme ultraviolet ( EUV ) lithography technology. These substrates are needed to develop low-defect EUV photomasks to enable 32-nm node high-volume production using EUV lithography. Intel's leading position in advanced …
