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Duv

Duv news and technical articles from Laser Focus World. Search Duv latest and archived news and articles

  1. US Patent Issued to Corning on May 1 for "Dense Homogeneous Fluoride Films for DUV Elements and Method of Preparing Same" (New York Inventors)

    Web

    Fri, 4 May 2012

    169,705, issued on May 1, was assigned to Corning Inc. (Corning, N.Y.). "Dense Homogeneous Fluoride Films for DUV Elements and Method of Preparing Same" was invented by Michael J. Cangemi (Victor, N.Y.), Horst Schreiber (Rochester

  2. Surfscan wafer inspection platform from KLA-Tencor first to use DUV illumination

    Article

    Fri, 22 Jul 2011

    platform to incorporate deep-ultraviolet ( DUV ) illumination , enabling dramatic advances ..... facility. Now we're announcing the first DUV unpatterned wafer inspection platform ..... Surfscan SP3 inspection system with the DUV sensitivity and throughput needed to reliably

  1. UV OPTICS: Nanowire grids make high-performance DUV polarizers

    Print

    Sun, 1 Apr 2007

    metrology, ultraviolet (UV) and deep-UV ( DUV ), polarizers are an area of ongoing research ..... Somerset, NJ) have developed more-robust DUV nanowire-grid polarizers with a 118 nm ..... improve transmittance and extinction ratio for DUV wavelengths, the NanoOpto scientists used

  2. Navitar zooms into DUV imaging

    Article

    Fri, 20 Oct 2006

    Navitar has developed a deep-ultraviolet ( DUV ) zoom lens that is designed to work with ..... company's NanoVue 248 nm zoom lens. The DUV operating wavelength effectively doubles ..... The lens is designed to work with 248 nm DUV infinity-corrected microscope objectives

  3. Digital joulemeter for pulsed lasers from DUV to far-IR

    Article

    Mon, 9 Mar 2009

    Channel Multiplexed Digital Joulemeter for Pulsed Lasers from DUV to Far IR. Model MDJ 10 is designed to measure pulse energy ..... a variety of energy detectors it can be used to measure from DUV to Far IR, nJ to mJ, and 1 pulse to 400 pps. "The MDJ10 is

  4. IBM researchers push DUV lithography envelope

    Article

    Tue, 21 Feb 2006

    features produced by deep-ultraviolet ( DUV ) lithography down to just under 30 nm ..... reach these small feature sizes. While DUV lithography uses 193-nm light and relatively ..... being considered for use in those future DUV systems that would create such fine features

  5. Positive Light Launches All-solid-state DUV Laser

    Article

    Tue, 27 Nov 2001

    The Indigo- DUV is a compact, all solid-state, deep UV ..... nm in a TEM00 spatial mode. The Indigo- DUV is currently used by leading semiconductor ..... and spectrometer calibration. The Indigo- DUV is based on a Ti:sapphire oscillator which

  6. Hinds Teams with SEMATECH to Develop DUV Instrument

    Article

    Thu, 14 Feb 2002

    International SEMATECH (ISMT) to expedite the development of a DUV birefringence measurement system that will allow the 157nm microlithography ..... quality. Hinds has been aggressively pursuing the development of a DUV birefringence measurement system and plans to have an engineering

  7. UV OPTICS: Calcium fluoride micro-optics improve DUV excimer laser systems

    Article

    Sun, 1 May 2011

    Besides being highly transparent in the DUV region, it also has excellent lifetime ..... relatively high damage threshold in the DUV , making it the material of choice for excimer ..... was the material of choice for almost all DUV applications, although it does degrade

  8. UV OPTICS: Calcium fluoride micro-optics improve DUV excimer laser systems

    Print

    Sun, 1 May 2011

    Besides being highly transparent in the DUV region, it also has excellent lifetime ..... relatively high damage threshold in the DUV , making it the material of choice for excimer ..... was the material of choice for almost all DUV applications, although it does degrade